HOMEFOILPLATEBARTARGETSHEETSTRIPTUBEPELLETWIREPOWDERRODCRUCIBLE
Home  >  Sputtering Targets  >  Tantalum Iron Silicon Alloy Disc / Disk (Ta-Fe-Si)
Tantalum Iron Silicon Alloy Disc / Disk (Ta-Fe-Si)

Tantalum Iron Silicon Alloy Disc / Disk (Ta-Fe-Si)

AvailableTantalum Iron Silicon Alloy Disc for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: TaFeSi
  • Purity: 99.5%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Disc
  • Ships to: Worldwide
  • Tantalum Iron Silicon Alloy Disc List

    Product Name Purity Size (inch) Thickness (mm)
    Tantalum Iron Silicon Alloy Disc / Disk 99.5% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    Tantalum iron silicon alloy disc is a kind of cylindrical tantalum iron silicon alloy sputtering target with low height. It is also called circular / cylindrical tantalum iron silicon alloy sputtering target. It is made into a tantalum iron silicon alloy blank through a special production process, then it is machined into a disc or cylindrical shape.

    Tantalum Iron Silicon Alloy Disc Application

    Tantalum iron silicon alloy disc can be used in many applications. The details are as follows:
    - Chemical vapor deposition (CVD);
    - Physical vapor deposition (PVD);
    - Used for preparing tantalum iron silicon alloy films.
    Previous:Tantalum Iron Silicon Alloy Sputtering Target (Ta-Fe-Si)
    Next:      Titanium Tantalum Alloy Sputtering Target (Ti-Ta)
    Hunan Fushel Technology Limited
    Room 1842, Block B, No.858 Dujuan Road, Yuelu District, Changsha, Hunan 410205, China
    Tel.: 86 731 8974 7657           Email: sales@fushel.com
    Copyright © 2022 Fushel  Sitemap
    FUSHEL

    Sales
    86 17377 877 377
    sales@fushel.com
    Wechat: fus360

    Email: sales@fushel.com    INQUIRY