Titanium Tantalum Alloy Sputtering Target (Ti-Ta)

Titanium Tantalum Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Titanium Tantalum Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Titanium Tantalum Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Titanium Tantalum Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Titanium Tantalum Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Titanium Tantalum Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Titanium Tantalum Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Titanium Tantalum Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Titanium tantalum alloy sputtering target is a kind of binary alloy sputtering target made of high-purity metal titanium powder and tantalum powder in a certain proportion. After the titanium tantalum alloy sputtering target is made into a titanium tantalum alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, titanium tantalum alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. titanium tantalum alloy targets. We can customize titanium tantalum alloy sputtering targets with different shapes according to customers' requirements, or we can customize targets with different titanium tantalum alloy compositions according to customers' chemical composition requirements.

Titanium Tantalum Alloy Sputtering Target Application

Titanium tantalum alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing titanium tantalum alloy films.