Tantalum Oxide Sputtering Target

Tantalum Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tantalum Oxide Sputtering Target	Circular	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Oxide Sputtering Target	Rectangular	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Oxide Sputtering Target	Annular	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Oxide Sputtering Target	Oval	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Oxide Sputtering Target	Cylindrical	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Oxide Sputtering Target	Planar	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Oxide Sputtering Target	Rotatable (rotary)	99.95% - 99.99%	0 - 48	≥ 1

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Tantalum oxide, commonly referred to as tantalum pentoxide(Ta2O5), is a white colorless crystalline powder in appearace. The density is 8.2g/cm3 and the melting point is 1872 ℃. Tantalum oxide is soluble in molten potassium bisulfate and hydrofluoric acid, but insoluble in water and other acids.

Tantalum oxide sputtering target is a kind of tantalum oxide raw material by sputtering deposition. According to the different shapes, tantalum oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tantalum oxide targets. Tantalum oxide is mainly used for making lithium tantalate single crystal and special optical glass with high refractive index and low dispersion. It can also be used as catalyst in chemical industry.

Tantalum Oxide Sputtering Target Application

High purity tantalum oxide sputtering target can be used in many applications. The details are as follows:
- Ferroelectric;
- Gate Dielectric;
- For CMOS;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.