Cerium Oxide (Ceria) Sputtering Target

Cerium Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Cerium Oxide Sputtering Target	Circular	99.99%	0 - 48	≥ 1
Cerium Oxide Sputtering Target	Rectangular	99.99%	0 - 48	≥ 1
Cerium Oxide Sputtering Target	Annular	99.99%	0 - 48	≥ 1
Cerium Oxide Sputtering Target	Oval	99.99%	0 - 48	≥ 1
Cerium Oxide Sputtering Target	Cylindrical	99.99%	0 - 48	≥ 1
Cerium Oxide Sputtering Target	Planar	99.99%	0 - 48	≥ 1
Cerium Oxide Sputtering Target	Rotatable (rotary)	99.99%	0 - 48	≥ 1

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Cerium oxide is a white or light yellow powder. The chemical formula is CeO2 and the density is 7.13g/cm3. The melting point is 2397 ℃. The boiling point is 3500 ℃. The appearance of pure ceria is white heavy powder or cubic crystal, and the appearance of low purity ceria is light yellow to reddish brown. Cerium oxide is insoluble in water and acid.

Cerium oxide sputtering target is a kind of high-purity cerium oxide raw material by sputtering deposition. According to the different shapes, cerium oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) cerium oxide targets. It can be used as polishing material, catalyst, catalyst carrier (promoter), ultraviolet absorber, fuel cell electrolyte, automobile exhaust absorber, electronic ceramics, etc.

Cerium Oxide Sputtering Target Application

High purity cerium oxide sputtering target can be used in many applications. The details are as follows:
- Ferroelectric;
- Gate Dielectric;
- For CMOS;
- Non-volatile Memory;
- Thin film capacitor;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.