High Purity Cerium Oxide Sputtering Target

High Purity Cerium Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Cerium Oxide Sputtering Target	Circular	99.99%	0 - 48	≥ 1
High Purity Cerium Oxide Sputtering Target	Rectangular	99.99%	0 - 48	≥ 1
High Purity Cerium Oxide Sputtering Target	Annular	99.99%	0 - 48	≥ 1
High Purity Cerium Oxide Sputtering Target	Oval	99.99%	0 - 48	≥ 1
High Purity Cerium Oxide Sputtering Target	Cylindrical	99.99%	0 - 48	≥ 1
High Purity Cerium Oxide Sputtering Target	Planar	99.99%	0 - 48	≥ 1
High Purity Cerium Oxide Sputtering Target	Rotatable (rotary)	99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity cerium oxide sputtering target refers to the high purity cerium oxide sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity ceria sputtering target.

High Purity Cerium Oxide Sputtering Target Application

High purity cerium oxide sputtering target can be used in many applications. The details are as follows:
- Ferroelectric;
- Gate Dielectric;
- For CMOS;
- Non-volatile Memory;
- Thin film capacitor;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.