High Purity Aluminum Sputtering Target (Al)

High Purity Aluminum Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Aluminum Sputtering Target	Circular	99.99% - 99.9995%	0 - 48	≥ 1
High Purity Aluminum Sputtering Target	Rectangular	99.99% - 99.9995%	0 - 48	≥ 1
High Purity Aluminum Sputtering Target	Annular	99.99% - 99.9995%	0 - 48	≥ 1
High Purity Aluminum Sputtering Target	Oval	99.99% - 99.9995%	0 - 48	≥ 1
High Purity Aluminum Sputtering Target	Cylindrical	99.99% - 99.9995%	0 - 48	≥ 1
High Purity Aluminum Sputtering Target	Planar	99.99% - 99.9995%	0 - 48	≥ 1
High Purity Aluminum Sputtering Target	Rotatable (rotary)	99.99% - 99.9995%	0 - 48	≥ 1

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High purity aluminum sputtering target refers to the high purity aluminum sputtering target with purity over 99%.  At present, we can provide high-purity aluminum sputtering targets including 4N (99.99%) aluminum sputtering target, 4N5 (99.995%) aluminum sputtering target, 5N (99.999%) aluminum sputtering target and 5N5 (99.9995%) aluminum sputtering target.

High Purity Aluminum Sputtering Target Application

High purity aluminum sputtering target has excellent conductivity and particle minimization film. 3N5-4N5 aluminum sputtering target is mostly used for rolling aluminum foil of electrolytic capacitor, lighting and data storage. 5N-6N ultrapure aluminum sputtering targets are mostly used in semiconductor devices, optoelectronic storage media, superconducting cable stabilizing materials and space shuttle scientific research.