Pure Metal Sputtering Target Pure metal sputtering target refers to a high-purity metal sputtering target that does not contain other impurities or other metal components. According to the different classifications of metals, they can be divided into precious metal sputtering targets, refractory metal sputtering targets, rare metal sputtering targets and so on.
Alloy Sputtering Target Alloy sputtering target refers to an alloy sputtering target made of two or more metals in different proportions. According to the different alloy composition, it can be divided into binary alloy sputtering target, ternary alloy sputtering target and multi-component alloy sputtering target.
Oxide Ceramic Sputtering Target Oxide sputtering target belongs to a ceramic sputtering target. It is mainly composed of oxides, and may also be composed of a variety of oxides. Common oxide sputtering targets are mainly composed of oxygen and metal elements. Sometimes, it may also be composed of a variety of oxides. For example, ITO sputtering targets.
Sulfide Ceramic Sputtering Target Sulfide sputtering target is a kind of high-purity ceramic compound raw material formed by metal or nonmetal with sulfur. It is mainly used for sputtering deposition film in special occasions.
Selenide Ceramic Sputtering Target Selenide sputtering target is a kind of high-purity ceramic compound raw material formed by metal or nonmetal with selenium. It is mainly used for sputtering deposition film in special occasions.
Boride Ceramic Sputtering Target Boride sputtering target is a kind of high-purity ceramic compound raw material formed by metal or nonmetal with boron. It is mainly used for sputtering deposition film in special occasions.
Carbide Ceramic Sputtering Target Carbide sputtering target is a kind of high-purity ceramic compound raw material formed by metal or nonmetal with carbon. It is mainly used for sputtering deposition film in special occasions.
Silicide Ceramic Sputtering Target Silicide sputtering target is a kind of high-purity ceramic compound raw material formed by metal or nonmetal with silicon. It is mainly used for sputtering deposition film in special occasions.
Telluride Ceramic Sputtering Target Telluride sputtering target is a kind of high-purity ceramic compound raw material formed by metal or nonmetal with tellurium. It is mainly used for sputtering deposition film in special occasions.
Nitride Ceramic Sputtering Target Nitride sputtering target is a kind of high-purity ceramic compound raw material formed by metal or nonmetal with nitrogen. It is mainly used for sputtering deposition film in special occasions.
Fluoride Ceramic Sputtering Target Fluoride sputtering target is a kind of high-purity ceramic compound raw material formed by metal or nonmetal with fluorine. It is mainly used for sputtering deposition film in special occasions.
